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Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography

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Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography

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Brand Name : HongJie

Certification : ISO 14001,ISO 9001,CE,EPA

Place of Origin : Shenzhen,China

MOQ : >=1sets

Price : US$44000~US$44500

Payment Terms : L/C,D/P,T/T,Western Union

Supply Ability : >300sets/month

Delivery Time : 1-7working days(depand on raw materials stocking)

Packaging Details : export standard wooden case

Model Number : HJ-UPWSe50T

Flow Rate : 50m³/H (Customizable)

Water Quality : Resistivity≥18.18 MΩ·cm (25°C)

Core Process : Reverse Osmosis + EDI + Polishing Resin

Key Components : RO Membrane Modules, EDI Units

Electricity Supply : 380V/220V

After-Sales Service : 2-Year Warranty

Operation Mode : Fully Automatic

Product Features : Stable Water Quality,Low Operation Cost,Reliable Performance

TOC : <0.5 ppb (Immersion fluid requirement <1 ppt)

Particulate Matter : >0.05μm particles <1 per mL

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I.Overview
Ultra-pure water plays an indispensable and critically important role in the lithography process. Lithography is one of the most core steps in semiconductor manufacturing, and lithography-grade ultra-pure water serves as the foundational guarantee for the continued evolution of “Moore's Law,” with requirements for cleanliness and chemical purity reach to an almost stringent extent. Ultra-pure water (UPW), with its extremely low impurity content, is the ideal medium to meet these stringent requirements. Its ultimate purity is the fundamental guarantee for ensuring precise, defect-free lithography patterns and high yield rates.

II.Process
Raw water → Multi-stage filtration → Reverse osmosis (RO) → Electrodeionization (EDI) → UV-ozone synergistic oxidation → Membrane degassing → Dual-stage mixed-bed polishing → Terminal filtration → Nitrogen-sealed water tank

III.Parameters

Parameter Required Value
Resistivity ≥18.18 MΩ·cm (25°C)
Total Organic Carbon (TOC) <0.5 ppb (Immersion fluid requirement <1 ppt)
Particulate Matter >0.05μm particles <1 per mL
Dissolved Oxygen (DO) <5 ppb
Bacterial Content <0.01 CFU/mL
Silicon Dioxide (SiO₂) <1 ppb
Boron/Sodium Ions <10 ppt

IV.Application Scenarios
Wafer Cleaning
Post-Development Washing
Dilution and Preparation of Photoresist/Chemicals
Equipment and Component Cleaning

V.Here is a guideline for you to get a proper quotation
Tell us the raw water/source of water(tap water, well water, or sea water, etc)
Provide water analysis report(TDS , conductivity, or resistivity, etc)
Required production capacity( 5m³/H, 50m³/H,or 500m³/H, etc)
What's the pure water used for( industrial,Food and Beverage,or agriculture, etc )


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Ultra Pure Water Equipment For Lithography

      

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